Publication Information

Title: Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection

Type: Journal

Info: Journal of The Electrochemical Society, 158 (5) C132-C138 (2011)

Date: 2011-01-27

DOI: http://dx.doi.org/10.1149/1.3560197

Author Information

Name

Institution

Eindhoven University of Technology

FEM Research Institute

FEM Research Institute

French National Centre for Scientific Research (CNRS)

French National Centre for Scientific Research (CNRS)

French National Centre for Scientific Research (CNRS)

French National Centre for Scientific Research (CNRS)

French National Centre for Scientific Research (CNRS)

Research Institute for Technical Physics and Materials Science

Research Institute for Technical Physics and Materials Science

Eindhoven University of Technology

Films

Deposition Temperature Range = 50-150C

75-24-1

7782-44-7

Deposition Temperature = 150C

75-24-1

7732-18-5

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Porosity

CV, Cyclic Voltammetry

Unknown

Chemical Composition, Impurities

TOF-SIMS, Time of Flight Secondary Ion Mass Spectrometry

Unknown

Compositional Depth Profiling

TOF-SIMS, Time of Flight Secondary Ion Mass Spectrometry

Unknown

Conformality, Step Coverage

TEM, Transmission Electron Microscope

Philips CM20

Images

TEM, Transmission Electron Microscope

Philips CM20

Adhesion

TEM, Transmission Electron Microscope

Philips CM20

Thickness

Ellipsometry

J.A. Woollam M-2000

Refractive Index

Ellipsometry

J.A. Woollam M-2000

Corrosion

NSS, Neutral Salt Spray

Unknown

Substrates

Al2024-T3 Aluminium

100Cr6 Steel

Keywords

Corrosion

Notes

699

Disclaimer

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