Potassium Permanganate-Based Slurry to Reduce the Galvanic Corrosion of the Cu/Ru/TiN Barrier Liner Stack during CMP in the BEOL Interconnects

Type:
Journal
Info:
ECS J. Solid State Sci. Technol. 2016 volume 5, issue 5, P256-P263
Date:
2016-02-01

Author Information

Name Institution
K. V. SagiClarkson University
H. P. AmanapuClarkson University
S. R. AletyClarkson University
S. V. BabuClarkson University

Films

Plasma Ru

Hardware used: Unknown


CAS#: 7664-41-7

Plasma TiN


Film/Plasma Properties

Substrates

Silicon
SiO2

Notes

774