Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates

Type:
Journal
Info:
J. Vac. Sci. Technol. A 33(1), Jan/Feb 2015
Date:
2014-10-31

Author Information

Name Institution
Joel W. ClanceyUniversity of Colorado, Boulder

Films

Thermal Al2O3


Thermal W

Hardware used: Custom Rotary

CAS#: 1590-87-0



Thermal Al2O3


Thermal W

Hardware used: Custom

CAS#: 1590-87-0



Film/Plasma Properties

Substrates

Notes

224