Publication Information

Title: Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor

Type: Journal

Info: J. Vac. Sci. Technol. A 32(3), May/Jun 2014

Date: 2014-04-02

DOI: http://dx.doi.org/10.1116/1.4871455

Author Information

Name

Institution

Korea Research Institute of Standards and Science (KRISS)

Films

Plasma SiO2 using ForALL OZONE

Deposition Temperature = 50C

6485-79-6

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Keywords

Notes

221

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

Follow plasma-ald.com

Follow @PlasmaALDGuy Tweet

Shortcuts



© 2014-2017 plasma-ald.com