Publication Information

Title: Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications

Type: Conference Proceedings

Info: 2015 6th IEEE International Workshop on Advances in Sensors and Interfaces (IWASI)

Date: 2015-06-18

DOI: http://dx.doi.org/10.1109/IWASI.2015.7184978

Author Information

Name

Institution

Technische Universität Berlin

Technische Universität Berlin

Sentech Instruments GmbH

Technische Universität Berlin

Technische Universität Berlin

Sentech Instruments GmbH

Sentech Instruments GmbH

Technische Universität Berlin

Technische Universität Berlin

Technische Universität Berlin

Technische Universität Berlin

Technische Universität Berlin

Technische Universität Berlin

Technische Universität Berlin

Films

Plasma TiO2 using SENTECH

Deposition Temperature = 270C

546-68-9

7732-18-5

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Leakage Current

I-V, Current-Voltage Measurements

Agilent B1500A Semiconductor Device Analyzer

Capacitance

C-V, Capacitance-Voltage Measurements

Agilent B1500A Semiconductor Device Analyzer

Substrates

Keywords

Notes

546

Disclaimer

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