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Electrical characteristics and step coverage of ZrO2 films deposited by atomic layer deposition for through-silicon via and metal-insulator-metal applications
Type:
Journal
Info:
Japanese Journal of Applied Physics 55, 016502 (2016)
Date:
2015-10-23
Author Information
| Name | Institution |
|---|---|
| Kyeong-Keun Choi | Pohang University of Science and Technology (POSTECH) |
| Chan Gyung Park | Pohang University of Science and Technology (POSTECH) |
| Deok-Kee Kim | Sejong University |
Films
Other ZrO2
Film/Plasma Properties
Characteristic: Breakdown Voltage
Analysis: I-V, Current-Voltage Measurements
Characteristic: Capacitance
Analysis: C-V, Capacitance-Voltage Measurements
Substrates
| Ta |
| TaN |
Notes
| 466 |