Publication Information

Title: Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study

Type: Journal

Info: J. Vac. Sci. Technol. A 30(1), Jan/Feb 2012

Date: 2011-10-19

DOI: http://dx.doi.org/10.1116/1.3659699

Author Information

Name

Institution

University of Helsinki

University of Helsinki

University of Helsinki

University of Helsinki

University of Helsinki

University of Helsinki

Beneq Oy

Films

Plasma SiO2 using Beneq TFS-200

Deposition Temperature = 250C

15112-89-7

7782-44-7

Plasma HfO2 using Beneq TFS-200

Deposition Temperature = 250C

352535-01-4

7782-44-7

Plasma Al2O3 using Beneq TFS-200

Deposition Temperature = 250C

75-24-1

7782-44-7

Plasma TiO2 using Beneq TFS-200

Deposition Temperature = 150C

546-68-9

7782-44-7

Plasma Ta2O5 using Beneq TFS-200

Deposition Temperature = 220C

6074-84-6

7782-44-7

Plasma Ag using Beneq TFS-200

Deposition Temperature = 120C

165461-74-5

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Images

SEM, Scanning Electron Microscopy

Hitachi S-4800 Field Emission Scanning Electron Microscope

Conformality, Step Coverage

SEM, Scanning Electron Microscopy

Hitachi S-4800 Field Emission Scanning Electron Microscope

Thickness

SEM, Scanning Electron Microscopy

Hitachi S-4800 Field Emission Scanning Electron Microscope

Substrates

Silicon

SiO2

TiN

Keywords

High Aspect Ratio

Notes

Aeronex GateKeeper and Entegris GateKeeper gas purifiers used.

Beneq TFS-200 study on high aspect ratio conformality of SiO2, HfO2, Al2O3, TiO2, Ta2O5, and Ag PEALD films.

171

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