Publication Information

Title: Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition

Type: Journal

Info: Journal of Vacuum Science & Technology A 34, 02D101 (2016)

Date: 2015-09-18

DOI: http://dx.doi.org/10.1116/1.4932039

Author Information

Name

Institution

Tokyo University of Science

Tokyo University of Science

Tokyo University of Science

Tokyo University of Science

University of Yamanashi

University of Yamanashi

University of Yamanashi

University of Yamanashi

SST Inc.

Hirosaki University

Films

Deposition Temperature = 300C

75-24-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Plasma Species

Langmuir Probe

Custom

Thickness

TEM, Transmission Electron Microscope

Unknown

Substrates

Ge

Keywords

Notes

372

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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