Publication Information

Title: Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents

Type: Journal

Info: J. Vac. Sci. Technol. A 33(1), Jan/Feb 2015

Date: 2014-10-10

DOI: http://dx.doi.org/10.1116/1.4899181

Author Information

Name

Institution

Yamagata University

Films

Plasma HfO2 using Custom ICP

Deposition Temperature = 25C

352535-01-4

7732-18-5

Plasma HfO2 using Custom ICP

Deposition Temperature = 25C

352535-01-4

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Keywords

Notes

232

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