Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents

Type:
Journal
Info:
J. Vac. Sci. Technol. A 33(1), Jan/Feb 2015
Date:
2014-10-10

Author Information

Name Institution
Kensaku KanomataYamagata University

Films



Film/Plasma Properties

Substrates

Notes

232