Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition

Type:
Journal
Info:
Journal of Applied Physics 114, 173511 (2013)
Date:
2013-10-21

Author Information

Name Institution
Hyunsoo JungHanyang University
Hagyoung ChoiHanyang University
Heeyoung JeonHanyang University
Sanghun LeeHanyang University
Hyeongtag JeonHanyang University

Films

Plasma Al2O3


Film/Plasma Properties

Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: Calcium Test

Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity

Characteristic: Compositional Depth Profiling
Analysis: AES, Auger Electron Spectroscopy

Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Plasma Species
Analysis: FHM, Floating Harmonic Method

Substrates

PES, Poly(Ether Sulfone)

Notes

575