Publication Information

Title: Patterned deposition by plasma enhanced spatial atomic layer deposition

Type: Journal

Info: physica status solidi (RRL) - Rapid Research Letters Volume 5, Issue 4, pages 165--167, 2011

Date: 2011-03-29

DOI: http://dx.doi.org/10.1002/pssr.201004542

Author Information

Name

Institution

TNO

TNO

TNO

TNO

TNO

Films

Plasma Al2O3 using Custom

Deposition Temperature = 150C

75-24-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Nanofilm EP3SE

Substrates

Si(100)

Keywords

Notes

692

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