Publication Information

Title: Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells

Type: Journal

Info: Applied Physics A 2015, Volume 120, Issue 3, pp 811-816

Date: 2015-06-05

DOI: http://dx.doi.org/10.1007/s00339-015-9280-3

Author Information

Name

Institution

Martin Luther University

Helmholtz-Zentrum Berlin für Materialien und Energie GmbH

Fraunhofer Center for Silicon Photovoltaics CSP

Martin Luther University

Martin Luther University

Helmholtz-Zentrum Berlin für Materialien und Energie GmbH

Martin Luther University

Films

Deposition Temperature = 180C

923956-62-1

7782-44-7

Deposition Temperature = 180C

923956-62-1

7782-44-7

7440-37-1

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Unknown

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Kratos Analytical Axis Ultra DLD

Minority Carrier Lifetime

Photoconductance

Sinton WCT-100

Electrical Properties

Bright I-V

Class C Sun Simulator

Substrates

Silicon

Keywords

Notes

376

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

Follow plasma-ald.com

Follow @PlasmaALDGuy Tweet

Shortcuts



© 2014-2017 plasma-ald.com