Publication Information

Title: Plasma-enhanced atomic layer deposition of BaTiO3

Type: Journal

Info: Scripta Materialia, Volume 111, Pages 106 - 109

Date: 2015-08-23

DOI: http://dx.doi.org/10.1016/j.scriptamat.2015.08.026

Author Information

Name

Institution

Stanford University

Stanford University

Stanford University

Stanford University

Stanford University

Films

Deposition Temperature Range N/A

0-0-0

546-68-9

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

Unknown

Unknown

Morphology, Roughness, Topography

Unknown

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

Unknown

Unknown

EOT, Equivalent Oxide Thickness

Unknown

Unknown

Leakage Current

Unknown

Unknown

Substrates

Keywords

High-k Dielectric Thin Films

Notes

517

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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