Publication Information

Title: Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells

Type: Journal

Info: Journal of Vacuum Science & Technology A 30, 040802 (2012)

Date: 2012-05-25

DOI: http://dx.doi.org/10.1116/1.4728205

Author Information

Name

Institution

Eindhoven University of Technology

Eindhoven University of Technology

Films

Deposition Temperature Range = 50-400C

75-24-1

7782-44-7

Deposition Temperature Range = 100-400C

75-24-1

7732-18-5

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Unknown

Gas Phase Species

OES, Optical Emission Spectroscopy

Unknown

Chemical Composition, Impurities

RBS, Rutherford Backscattering Spectrometry

Unknown

Lifetime

Photoconductance

Unknown

Interface Trap Density

Photoconductance

Unknown

Negative Fixed Charge Density

Photoconductance

Unknown

Images

SEM, Scanning Electron Microscopy

Unknown

Substrates

Silicon

Keywords

Passivation

Solar

Notes

Images of blistering.

667

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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