Publication Information

Title: Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process

Type: Journal

Info: Thin Solid Films 534 (2013) 515 - 519

Date: 2013-02-25

DOI: http://dx.doi.org/10.1016/j.tsf.2013.02.125

Author Information

Name

Institution

Kyung Hee University

Kyung Hee University

Kyung Hee University

Films

Plasma Al2O3 using Unknown

Deposition Temperature = 120C

75-24-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Water Vapor Transmission Rate (WVTR)

Water Vapor Transmission Rate (WVTR)

Mocon PERMATRAN-W Model 3/33

Water Vapor Transmission Rate (WVTR)

Calcium Test

Custom

Thickness

Ellipsometry

J.A. Woollam VASE

Refractive Index

Ellipsometry

J.A. Woollam VASE

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Thermo Scientific K-Alpha

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Digital Instruments Nanoscope III

Substrates

PEN, Polyethylene Napthalate

Keywords

Notes

567

Disclaimer

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