Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD

Type:
Journal
Info:
Chem. Vap. Deposition 2013, 19, 125--133
Date:
2013-05-16

Author Information

Name Institution
Stephen E. PottsEindhoven University of Technology
H. B. ProfijtEindhoven University of Technology
Robin RoelofsEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology

Films


Plasma SiO2


Plasma TiO2


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Substrates

Si with native oxide

Notes

577