Publication Information

Title: Plasma Enhanced Atomic Layer Deposition on Powders

Type: Conference Proceedings

Info: ECS Trans. 2014 volume 64, issue 9, 51-62

Date: 2014-10-06

DOI: http://dx.doi.org/10.1149/06409.0051ecst

Author Information

Name

Institution

Ghent University

Films

Thermal Al2O3 using Custom Rotary

Deposition Temperature Range N/A

Thermal TiO2 using Custom Rotary

Deposition Temperature Range N/A

Plasma AlN using Custom Rotary

Deposition Temperature Range N/A

Plasma TiN using Custom Rotary

Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Gas Phase Species

QMS, Quadrupole Mass Spectrometer

Unknown

Gas Phase Species

OES, Optical Emission Spectroscopy

Unknown

Thickness

XRF, X-Ray Fluorescence

Unknown

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Conformality, Step Coverage

TEM, Transmission Electron Microscope

Unknown

Substrates

ZnO

Keywords

Powders/Particles

Notes

(PE)ALD of Al2O3, TiO2, AlN, and TiN on powders with custom rotary system.

277

Disclaimer

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