Publication Information

Title: Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth

Type: Journal

Info: J. Vac. Sci. Technol. A 31, 01A106 (2013)

Date: 2012-10-04

DOI: http://dx.doi.org/10.1116/1.4756906

Author Information

Name

Institution

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Films

Plasma Al2O3 using Custom

Deposition Temperature Range N/A

75-24-1

7782-44-7

Plasma CoOx using Custom

Deposition Temperature Range N/A

1277-43-6

7782-44-7

Plasma TiO2 using Custom

Deposition Temperature Range N/A

123927-75-3

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Electron Temperature, Te

Langmuir Probe

Custom

Electron Density, ne

Langmuir Probe

Custom

Ion Energy

RFEA, Retarding Field Energy Analyzer

Impedans Semion

Ion Flux

RFEA, Retarding Field Energy Analyzer

Impedans Semion

OES

OES, Optical Emission Spectroscopy

Ocean Optics UBS 4000-UV-VIS

Thickness

Ellipsometry

J.A. Woollam M-2000D

Density

XRR, X-Ray Reflectivity

PANalytical Xpert PRO MRD X-ray Diffractometer

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Thermo Scientific K-Alpha

Film Stress

Wafer Curvature

KSA MOS Ultra-Scan

Substrates

Si(100)

Keywords

Substrate Biasing

Thin Film

Atomic Layer Deposition

Inductively Coupled Plasma

Notes

O2 does not gas react with TMA, Star-Ti, or CoCp2

Bias impacts TiO2 phase. Low bias produces anatase while high bias produces rutile.

RTA in O2

62

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