Publication Information

Title: Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition

Type: Journal

Info: Electrochemical and Solid-State Letters, 12(2) G5-G8 (2009)

Date: 2008-11-14

DOI: http://dx.doi.org/10.1149/1.3028218

Author Information

Name

Institution

Korea Advanced Institute of Science and Technology

Hynix Semiconductor

Hynix Semiconductor

Hynix Semiconductor

Korea Advanced Institute of Science and Technology

Films

Plasma SrTiO3 using Unknown

Deposition Temperature Range N/A

36830-74-7

546-68-9

7782-44-7

Thermal RuO2 using Unknown

Deposition Temperature Range N/A

32992-96-4

7782-44-7

Plasma SrO using Unknown

Deposition Temperature Range N/A

36830-74-7

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thermal Stability

Anneal

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Rigaku

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

TEM, Transmission Electron Microscope

Unknown

Morphology, Roughness, Topography

SEM, Scanning Electron Microscopy

Hitachi S-4800 Field Emission Scanning Electron Microscope

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

SPA 400

Dielectric Constant, Permittivity

C-V, Capacitance-Voltage Measurements

Unknown

EOT, Equivalent Oxide Thickness

C-V, Capacitance-Voltage Measurements

Unknown

Substrates

Ru

SiO2

Keywords

High-k Dielectric Thin Films

DRAM chips

Notes

800C O2 anneal of RuO2 etched the film.

77

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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