Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films

Type:
Journal
Info:
APPLIED PHYSICS LETTERS 100, 053106 (2012)
Date:
2011-12-28

Author Information

Name Institution
Sharka M. ProkesU.S. Naval Research Laboratory
Orest J. GlembockiU.S. Naval Research Laboratory
Erin ClevelandU.S. Naval Research Laboratory
Joshua D. CaldwellU.S. Naval Research Laboratory
Edward FoosU.S. Naval Research Laboratory
Jaakko T. NiinistöUniversity of Helsinki
Mikko K. RitalaUniversity of Helsinki

Films


Film/Plasma Properties

Characteristic: Thickness
Analysis: n,k Spectrometry

Characteristic: Microstructure
Analysis: SEM, Scanning Electron Microscopy

Characteristic: SERS
Analysis: SERS, Surface Enhanced Raman Scattering

Characteristic: SERS
Analysis: SERS, Surface Enhanced Raman Scattering

Substrates

Si(100)

Notes

Beneq TFS-200 PEALD Ag thin film plasmonic behavior study.
300