Publication Information

Title: Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition

Type: Journal

Info: Journal of The Electrochemical Society, 158 (8) G169-G172 (2011)

Date: 2011-06-01

DOI: http://dx.doi.org/10.1149/1.3594766

Author Information

Name

Institution

Yonsei University

Yonsei University

Samsung Electronics Co.

Air Liquide

Air Liquide

Air Liquide

Applied Materials

Applied Materials

Applied Materials

Yonsei University

Films

Deposition Temperature = 250C

122528-16-9

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Capacitance

C-V, Capacitance-Voltage Measurements

Keithley 590 CV Analyzer

Interface State Density

C-V, Capacitance-Voltage Measurements

Keithley 590 CV Analyzer

Hysteresis

C-V, Capacitance-Voltage Measurements

Keithley 590 CV Analyzer

Dielectric Constant, Permittivity

C-V, Capacitance-Voltage Measurements

Keithley 590 CV Analyzer

Effective Oxide Charge, Qeff

C-V, Capacitance-Voltage Measurements

Keithley 590 CV Analyzer

Flat Band Voltage

C-V, Capacitance-Voltage Measurements

Keithley 590 CV Analyzer

Leakage Current

I-V, Current-Voltage Measurements

Agilent 4155C Semiconductor Parameter Analyzer

Evaporation Characteristics

TGA, Thermo Gravimetric Analysis

Unknown

Thickness

Ellipsometry

Unknown

Refractive Index

Ellipsometry

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Unknown

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Substrates

Si(100)

Keywords

Annealing

Atomic Layer Deposition

Cerium Compounds

Current Density

Leakage Currents

MOS Capacitors

Plasma CVD

Stoichiometry

Thermal Stability

Notes

Films underwent O2 anneal.

Substrates RCA cleaned + HF dipped.

37

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