Publication Information

Title: In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3

Type: Journal

Info: APPLIED PHYSICS LETTERS 89, 131505 (2006)

Date: 2006-09-04

DOI: http://dx.doi.org/10.1063/1.2357886

Author Information

Name

Institution

Eindhoven University of Technology

West Bohemia University

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Films

Plasma Al2O3 using Custom ICP

Deposition Temperature = 70C

75-24-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

QCM, Quartz Crystal Microbalance

Unknown

Gas Phase Species

QMS, Quadrupole Mass Spectrometer

Unknown

Plasma Species

OES, Optical Emission Spectroscopy

Unknown

Substrates

Keywords

Reaction Kinetics

Notes

Custom ICP PEALD Al2O3 reaction mechanism study.

188

Disclaimer

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