Publication Information

Title: Densification of Thin Aluminum Oxide Films by Thermal Treatments

Type: Journal

Info: Materials Sciences and Applications, 2014, 5, 628-638

Date: 2014-06-04

DOI: http://dx.doi.org/10.4236/msa.2014.58065

Author Information

Name

Institution

Fraunhofer Institute for Applied Solid State Physics

Fraunhofer Institute for Applied Solid State Physics

Fraunhofer Institute for Applied Solid State Physics

Fraunhofer Institute for Applied Solid State Physics

Fraunhofer Institute for Applied Solid State Physics

Fraunhofer Institute for Applied Solid State Physics

Fraunhofer Institute for Applied Solid State Physics

Fraunhofer Institute for Applied Solid State Physics

Ilmenau University of Technology

Ilmenau University of Technology

Ilmenau University of Technology

Ilmenau University of Technology

Films

Deposition Temperature = 300C

75-24-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

XRR, X-Ray Reflectivity

Unknown

Density

XRR, X-Ray Reflectivity

Unknown

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

GIXRD, Grazing Incidence X-Ray Diffraction

PANalytical Xpert PRO MRD X-ray Diffractometer

Thickness

Ellipsometry

J.A. Woollam VASE

Refractive Index

Ellipsometry

J.A. Woollam VASE

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

J.A. Woollam VASE

Unknown

FTIR Spectroscopic Ellipsometry

Sentech SE900 FTIR Ellipsometer

Dielectric Constant, Permittivity

C-V, Capacitance-Voltage Measurements

Unknown

Breakdown Voltage

I-V, Current-Voltage Measurements

Unknown

Substrates

4H n-SiC(0001)

Keywords

Notes

AlOx samples annealed in N2 for 1 hour at 500 - 1025C.

145

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