Publication Information

Title: Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source

Type: Journal

Info: Chem. Vap. Deposition 2002, 8, No. 5, p. 195-197

Date: 2002-04-29

DOI: http://dx.doi.org/10.1002/1521-3862(20020903)8:5<195::AID-CVDE195>3.0.CO;2-9

Author Information

Name

Institution

Hynix Semiconductor

Hynix Semiconductor

Hynix Semiconductor

Films

Plasma SrO using Custom

Deposition Temperature Range N/A

0-0-0

7782-44-7

Plasma TiO2 using Custom

Deposition Temperature Range N/A

546-68-9

7782-44-7

Plasma SrTiO3 using Custom

Deposition Temperature Range N/A

0-0-0

546-68-9

7782-44-7

Thermal SrO using Custom

Deposition Temperature Range N/A

0-0-0

7732-18-5

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

TEM, Transmission Electron Microscope

Unknown

Thickness

TEM, Transmission Electron Microscope

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Unknown

Substrates

Si(100)

Keywords

Capacitors

Notes

Sr precursor 0.07M in menthanol with liquid delivery.

Astron Astex remote plasma generator.

124

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