Publication Information

Title: Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure

Type: Journal

Info: Materials Research Bulletin 64 (2015) 1-5

Date: 2014-12-03

DOI: http://dx.doi.org/10.1016/j.materresbull.2014.12.012

Author Information

Name

Institution

Samsung Electronics Co.

Films

Plasma SrO using Unknown

Deposition Temperature Range N/A

36830-74-7

7782-44-7

Plasma SrTiO3 using Unknown

Deposition Temperature = 225C

36830-74-7

546-68-9

7782-44-7

Plasma Al2O3 using Unknown

Deposition Temperature = 225C

75-24-1

7782-44-7

Plasma AlStTiO using Unknown

Deposition Temperature = 225C

75-24-1

36830-74-7

546-68-9

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Keywords

Notes

207

Disclaimer

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