Publication Information

Title: Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition

Type: Journal

Info: ACS Nano, 2013, 7 (12), pp 11333-11340

Date: 2013-11-19

DOI: http://dx.doi.org/10.1021/nn405194e

Author Information

Name

Institution

Yonsei University

Yonsei University

Yonsei University

Yonsei University

Yonsei University

Yonsei University

Yonsei University

Yonsei University

Yeungnam University

Air Liquide

Yonsei University

Films

Plasma WO3 using Custom

Deposition Temperature Range N/A

0-0-0

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Images

Optical Microscopy

Unknown

Thickness

AFM, Atomic Force Microscopy

Unknown

Raman Shift

Raman Spectroscopy

Unknown

Photoluminescence

PL, PhotoLuminescence

Unknown

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

TEM, Transmission Electron Microscope

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

Electron Diffraction

Unknown

Electron Mobility

Unknown

Unknown

Subthreshold Swing

Unknown

Unknown

Images

SEM, Scanning Electron Microscopy

Unknown

Chemical Composition, Impurities

HAADF, High-Angle Annular Dark Field

Unknown

Elemental Mapping

EDS, EDX, Energy Dispersive X-ray Spectroscopy

Unknown

Substrates

SiO2

Keywords

2D Material

Notes

Thermal ALD HfO2 used for high-k gate dielectric on FET tests.

137

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